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Tel Mark 8 | Rite Track Refurbished Tel Mark 7/8 Coat Develop System 12679 좋은 평가 이 답변

당신은 주제를 찾고 있습니까 “tel mark 8 – RIte Track Refurbished TEL Mark 7/8 Coat Develop System“? 다음 카테고리의 웹사이트 https://ro.taphoamini.com 에서 귀하의 모든 질문에 답변해 드립니다: ro.taphoamini.com/wiki. 바로 아래에서 답을 찾을 수 있습니다. 작성자 Rite Track Equipment Services 이(가) 작성한 기사에는 조회수 3,198회 및 좋아요 12개 개의 좋아요가 있습니다.

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Coater/Developer Mark Series – Tokyo Electron

… Mark was the first domestic model of coater/developer for TEL which was based … The CLEAN TRACK™ Mark 7/8’s was the innovative coater developer system …

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Source: www.tel.com

Date Published: 12/14/2022

View: 927

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주제와 관련된 더 많은 사진을 참조하십시오 RIte Track Refurbished TEL Mark 7/8 Coat Develop System. 댓글에서 더 많은 관련 이미지를 보거나 필요한 경우 더 많은 관련 기사를 볼 수 있습니다.

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RIte Track Refurbished TEL Mark 7/8 Coat Develop System
RIte Track Refurbished TEL Mark 7/8 Coat Develop System

주제에 대한 기사 평가 tel mark 8

  • Author: Rite Track Equipment Services
  • Views: 조회수 3,198회
  • Likes: 좋아요 12개
  • Date Published: 2019. 3. 6.
  • Video Url link: https://www.youtube.com/watch?v=dKe70V42GPE

Coater/Developer Mark Series

Best selling model with repeated innovative improvements following the posterity

The CLEAN TRACK™ Mark was the first domestic model of coater/developer for TEL which was based on the photoresist system developed and manufactured in US. The next developed CLEAN TRACK™ Mark-II was able to transit to larger wafer size to 6 inches with advanced controller. Through multiple efforts like introducing in-line models with exposure tools the system’s continuous improvement involved higher productivity. The CLEAN TRACK™ Mark-V realized various innovative technologies such as stacked clean oven module layout and high-speed wafer handling robotics, etc, so dramatically changed the concept of the conventional photoresist systems and set the worldwide standards for them.

TEL Mark 8

Missing parts:

FC-9821Ke Controller

Robotic arm assembly and board

ADH/Adhesion Unit

4x LHP units

2x Cool Plate units

WDS

4x RKC Controllers

a-1. Wafer Size: 200mm Dual Block System

b-1. Wafer Flow: Right to Left

CSB unit is in right side and interface station unit is in left side

c-1. Process Block: 2ea.

d-1. Block #1

aa. TEL Clean Track Mark 8 FC-9821Ke Controller: Missing

bb. Stage/Indexer: SMIF/Cassette Station

cc. CSA/Cassette Station Arm: 1ea.

e-1. Block #2

Normal Photo Resist Coat 2-1, 2-2 Units:

– 2ea. normal photo resist dispense nozzles per coat

– Total 2 normal photo resist dispense nozzles and 2 RRC resist pump per coat unit

– 1-side rinse nozzle (programmable side rinse EBR) for normal coat unit

– Dual back rinse nozzle

– Installed photo resist temperature control

– Installed motor flange temperature control

– Photo resist drain type: Direct gravity drain type

– Photo resist bottle quantity: 2 spaces

– Installed photo resist auto exchange

– Installed dummy dispense system

– Cup type: PP for upper cup and inner cup

– Auto damper: Cylinder only

f-1. Block #3

aa. Develop 3-1, 3-2 units:

– Single E2 nozzle for develop unit

– Dual top rinse nozzle for develop unit

– Installed back rinse nozzles for develop unit

– Installed develop temperature control

– Installed motor flange temperature control

– Drain type: Direct gravity drain type

– Installed auto damper

– Installed auto dummy dispense system

– Cup type: Stainless steel for upper cup and PP for inner cup

bb. PRA/Process Block Robotics Arm: 2ea/Missing assembly with board

cc. ADH/Adhesion Unit: 2ea/missing

dd. LHP/Low Temperature Oven Unit: 2ea/4ea missing

ee. COL/Cool Plate Unit: 4ea/2ea missing

ff. WDS/Washing Disk Stock: Missing

g-1. THC/Temperature and Humidity Controller: 1ea/ TEL OEM 2-CUP Shinwa T&H

Missing 4ea RKC controller

h-1. External Chemical Supply System:

aa. 1st. Section: Solvent Supply System

– Solvent Chemical type: 1ea.

– Chemical Center Supply System (CCSS) with 2 of 3liter Teflon Buffer Tank

– Tank Type: 2-Buffer tank (3liter tank, Teflon) to cover two coat units.

bb. 2nd. Section: Develop Supply System

– Develop Chemical type: 1ea.

– Chemical Center Supply System (CCSS) with 2 of 3liter Teflon Buffer Tank

– Tank Type: 2-Buffer tank (3liter tank, Teflon) to cover two DEV units.

i-1. HMDS Supply System for 2 AD Unit

– Chemical Type: 1ea

– Chemical 1/4gal. Bottle with 1L Buffer Tank

– Tank Auto Switch-off/Exchange: N/A

j-1. TEL OEM SMC Multi Controller: 1ea. @ rear main body

k-1. Power Transformer AC Cabinet: 208Vac, 3-Phase, 50/60Hz

4. Sales Condition

As-is/Where-is

Used Clean Track Mark 8 for sale. Tokyo Electron – TEL equipment & more

USED Manufacturer: Kobelco

Model: SK210

Used KOBELCO SK210 Excavator Original Made in Japan Machine Runs & Works Great 100% Work Ready Regularly maintained and serviced Low Hours Worked Model 90% New Good Engine Transmissions Hydraulics Track s No oil L…

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